Investigation of Antiadhesive Coatings for Nanoimprinting Lithography
نویسندگان
چکیده
This article presents an investigation of antiadhesive coatings for nanoimprinting lithography. To get the optimum parameters of the coating process, a surface-contact angle goniometer and an atomic force microscope were used for detailed comparison of the coated surfaces produced with different process parameters. With the antiadhesive coating, the contact angle of deionized water on the mold surfaces changed from 30 –90 . The relationships between the coated surface characteristics and the coating parameters were experimentally studied. Under certain conditions, before it reached ∼90 the contact angle increased significantly with increased coating time, baking time and solution concentration. The nanoimprinting process was then performed using the mold coated with selected parameters, and the imprinting results showed that the coating was effective to reduce the interfacial forces between the mold and the polymer for nanoimprinting. The contact angle measurements and the atomic force microscope investigation showed that the antiadhesive layer had no obvious degradation after the imprinting process.
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